Combined e-beam lithography using different energies

0463775 - ÚPT 2017 AT eng C - Conference Paper (international conference)
Krátký, Stanislav - Kolařík, Vladimír - Horáček, Miroslav - Meluzín, Petr - Král, Stanislav
Combined e-beam lithography using different energies.
MNE. 42nd International Conference on Micro and Nano Engineering. Viena: Mondial, 2016.
[Interantional Conference on Micro and Nano Engineering /42./. Vienna (AT), 19.09.2016-23.09.2016]
R&D Projects: GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Keywords : e-beam lithography * absorbed energy density * micro-optical elements
Subject RIV: BH - Optics, Masers, Lasers

This contribution deals with the possibilities of combined exposure of e-beam systems working with significant difference of primary electron energies (Vistec EBPG5000+ ES – 100keV, Tesla BS600 – 15keV). Variation of primary electron energies means the difference of absorbed energy density in electron resist. It allows us to find such wet developers that develop patterns from both systems independently (if the right order of
procedures is kept). This solution is very interesting for preparing of very complex optical elements without limitation of each system.
Permanent Link: http://hdl.handle.net/11104/0262858