Modifikace materiálů pro optiku, elektroniku a spintroniku iontovým svazkem – iontová implantace pomocí urychlovačů nebo laserem indukovaného plazmatu

0460778 - ÚJF 2017 CZ cze K - Conference Paper (Czech conference)
Macková, Anna
Modifikace materiálů pro optiku, elektroniku a spintroniku iontovým svazkem – iontová implantace pomocí urychlovačů nebo laserem indukovaného plazmatu.
[Ion beam modification of materials for optics, electronic and spintronics -ion implantation using accelerators or laser induced plasma ion generation.]
Zpravodaj ČVS. Vol. 1. Praha: Česká vakuová společnost, 2016, s. 33-43. ISSN 1213-2705.
[LŠVT - Letní škola vakuové techniky 2016. Bořetice (CZ), 30.05.2016-02.06.2016]
Institutional support: RVO:61389005
Keywords : modification * materials * ion implantation
Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders

Ion beam modification offers a broad field of the creating the new functional materials and nano-structures for optics, electronics, spintronics and other material branches. Using ions produced by ion accelerators or implanters
means the usage of the monoenergetic beams for precise doped layer, nano-particles or cluster creation by varying the ion implantation specie versus matrix combination together with the implantation energy, ion flux etc. Recently
appears the multienergetic ion implantation which is realized by using of the intense laser shot generating plasma from the specially designed targets, where the ions are accelerated and can be then implanted into the various
materials. This contribution will present an overview and comparison of different ion beam modification techniques, plasma ion implantation will be also mentioned.
Permanent Link: http://hdl.handle.net/11104/0260774