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XUV Source Based on the Fast High-Current Capillary-Discharge System
- 1.0453286 - ÚFP 2020 RIV US eng C - Conference Paper (international conference)
Schmidt, Jiří - Koláček, Karel - Frolov, Oleksandr - Štraus, Jaroslav
XUV Source Based on the Fast High-Current Capillary-Discharge System.
Proceedings of the 2014 IEEE International Power Modulator and High Voltage Conference, IPMHVC 2014. Santa Fe: IEEE, Institute of Electrical and Electronics Engineers Inc, 2014 - (Garner, A.), s. 360-362. ISBN 978-1-4673-7323-4.
[IEEE International Power Modulator and High Voltage Conference, IPMHVC 2014. Santa Fe (US), 01.06.2014-05.06.2014]
R&D Projects: GA MŠMT(CZ) LG13029; GA ČR(CZ) GA14-29772S
Institutional support: RVO:61389021
Keywords : Capillary discharge * XUV laser
OECD category: Fluids and plasma physics (including surface physics)
https://ieeexplore.ieee.org/document/7287283
Our aim is to achieve lasing at 13.4 nm, using excited H-like N ions. The primary pumping process is a three-body collisional recombination one. Nowadays, the fast high-current capillary-discharge experiments with nitrogen-filled capillary are in progress. In this paper the recent results obtained from CAPEX discharge system will be presented (e.g. electrical and XUV characteristics of nitrogen plasma discharge).
Permanent Link: http://hdl.handle.net/11104/0254113
Number of the records: 1