6-axis laser interferometry measurement system for a nanometrology standard

0451173 - ÚPT 2016 NL eng C - Conference Paper (international conference)
Hrabina, Jan - Holá, Miroslava - Lazar, Josef - Číp, Ondřej
6-axis laser interferometry measurement system for a nanometrology standard.
Photomechanics 2015. Book of Abstracts and Program. Delft: Delft University of Technology, 2015, s. 66-69.
[Photomechanics 2015. Delft (NL), 25.05.2015-27.05.2015]
R&D Projects: GA ČR GB14-36681G; GA TA ČR TA02010711; GA TA ČR TA01010995; GA TA ČR TE01020233; GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institutional support: RVO:68081731
Subject RIV: BH - Optics, Masers, Lasers

We present an overview of approaches to the design of nanometrology measuring setups with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a positioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.
Permanent Link: http://hdl.handle.net/11104/0252368