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On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

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    0449337 - FZÚ 2016 RIV NL eng J - Journal Article
    Kment, Š. - Hubička, Zdeněk - Krysa, C. - Sekora, D. - Zlámal, M. - Olejníček, Jiří - Čada, Martin - Kšírová, Petra - Remeš, Zdeněk - Schmuki, P. - Schubert, E. - Zbořil, R.
    On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method.
    Applied Catalysis B - Environmental. Roč. 165, Apr (2015), s. 344-350. ISSN 0926-3373
    R&D Projects: GA ČR GAP108/12/2104; GA MŠk LH12043
    Institutional support: RVO:68378271
    Keywords : ALD * HiPIMS * passivation layer * photoelectrochemical water splitting * very thin films
    Subject RIV: BL - Plasma and Gas Discharge Physics
    Impact factor: 8.328, year: 2015

    Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties.
    Permanent Link: http://hdl.handle.net/11104/0250894