On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

0449337 - FZÚ 2016 RIV NL eng J - Journal Article
Kment, Š. - Hubička, Zdeněk - Krysa, C. - Sekora, D. - Zlámal, M. - Olejníček, Jiří - Čada, Martin - Kšírová, Petra - Remeš, Zdeněk - Schmuki, P. - Schubert, E. - Zbořil, R.
On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method.
Applied Catalysis B - Environmental. Roč. 165, Apr (2015), s. 344-350. ISSN 0926-3373. E-ISSN 1873-3883
R&D Projects: GA ČR GAP108/12/2104; GA MŠMT LH12043
Institutional support: RVO:68378271
Keywords : ALD * HiPIMS * passivation layer * photoelectrochemical water splitting * very thin films
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 8.328, year: 2015

Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties.
Permanent Link: http://hdl.handle.net/11104/0250894