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Preparation of Thin Silicon Layers Highly Doped with Manganese by Reactive Pulsed Laser Deposition
- 1.0449017 - ÚCHP 2016 DE eng C - Conference Paper (international conference)
Koštejn, Martin - Dřínek, Vladislav - Fajgar, Radek
Preparation of Thin Silicon Layers Highly Doped with Manganese by Reactive Pulsed Laser Deposition.
Abstracts and Program. -: -, 2015, s. 89. ISBN N.
[International Conference on Amorphous and Nanocrystalline Semiconductors ICANS 26 /26./. Aachen (DE), 13.09.2015-18.09.2015]
R&D Projects: GA ČR GA13-25747S
Institutional support: RVO:67985858
Keywords : silicon layers * laser deposition * manganese
Subject RIV: CF - Physical ; Theoretical Chemistry
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Permanent Link: http://hdl.handle.net/11104/0250600
File Download Size Commentary Version Access SKMBT_C22015100207540.pdf 1 618.7 KB Publisher’s postprint open-access
Number of the records: 1