Number of the records: 1
Nanoscale Characterization of Ultra-thin Tungsten Films Deposited by Radio-Frequency Magnetron Sputtering
- 1.0447554 - ÚPT 2016 RIV US eng C - Conference Paper (international conference)
Martínek, T. - Kudělka, J. - Navrátil, M. - Křesálek, V. - Fejfar, Antonín - Hývl, Matěj - Sobota, Jaroslav
Nanoscale Characterization of Ultra-thin Tungsten Films Deposited by Radio-Frequency Magnetron Sputtering.
IEEE NANO 2015 Proceedings. 15th International Conference on Nanotechnology. Danvers: IEEE, 2015. ISBN 978-1-4673-8156-7.
[IEEE NANO 2015. International Conference on Nanotechnology /15/. Rome (IT), 27.07.2015-30.07.2015]
Institutional support: RVO:68081731 ; RVO:68378271
Keywords : atomic force microscopy * tungsten * ultra-thin film * nanocharacterization * nanometrology
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
In this article, atomic force microscopy was used for nanoscale characterization of ultra-zhin tungsten films wich were deposited on silicon substrate. Radio-frequency magnetron sputtering was used for tungsten deposition on the sueface.
Permanent Link: http://hdl.handle.net/11104/0252386
Number of the records: 1