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Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring

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    0445337 - ÚFP 2016 RIV US eng C - Conference Paper (international conference)
    Koláček, Karel - Schmidt, Jiří - Štraus, Jaroslav - Frolov, Oleksandr - Juha, Libor - Chalupský, Jaromír
    Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring.
    Proceeding of SPIE Vol. 9255: 20th International Symposium on High Power Systems and Applications 2014, HPLS and A 2014. Vol. 9255. Bellingham: SPIE-INT SOC OPTICAL ENGINEERING, 2015 - (Tang, C.; Chen, S.; Tang, X.), 92553U-92553U. SPIE, 9255. ISBN 978-1-62841-322-9. ISSN 0277-786X.
    [International Symposium on High Power Laser Systems and Applications 2014/20./. Chengdu (CN), 25.08.2014-29.08.2014]
    R&D Projects: GA ČR(CZ) GA14-29772S
    Institutional support: RVO:61389021 ; RVO:68378271
    Keywords : interaction of XUV radiation with solid surface * desorption * ablation * nanostructuring * nanopatterning * ablation plume * ablation jet
    Subject RIV: BH - Optics, Masers, Lasers; BH - Optics, Masers, Lasers (FZU-D)
    Result website:
    http://spie.org/Publications/Proceedings/Volume/9255DOI: https://doi.org/10.1117/12.2071273

    It was confirmed that nanostructuring can be realised only in the desorption area.In this area the efficiency of particle-removal from a thin surface layer (of the thickness of laser penetration depth) is very small(<10%) for short (femtosecond) laser pulses and for long (nanosecond) pulses and difficult removable material (like GaAs, Si, …).In this case the profile of pattern imprinted by one shot is shallow (units of nanometers only. However,for long (nanosecond) pulses and easily removable material (like PMMA)this changes from 0% at the beam periphery up to ~90% at the ablation contour and, therefore,the profile of imprinted pattern can be relatively deep(up to 200-300 nm by one shot).A suggested interpretation explains this fact in terms of gradual release of target material during laser pulse, which is accompanied by gradually increased laser penetration depth.However, simultaneously laser attenuation in ablated plum should be considered.The detail dynamics of this process is
    Permanent Link: http://hdl.handle.net/11104/0247665
     
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