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Deposition of carbon nanostructures by surfatron generated discharge
- 1.0440056 - FZÚ 2015 RIV CZ eng J - Journal Article
Davydova, Marina - Šmíd, Jiří - Hubička, Zdeněk - Kromka, Alexander
Deposition of carbon nanostructures by surfatron generated discharge.
Acta Polytechnica. Roč. 54, č. 6 (2014), s. 389-393. ISSN 1210-2709. E-ISSN 1805-2363
R&D Projects: GA TA ČR TA01011740; GA ČR(CZ) GP14-06054P
Institutional support: RVO:68378271
Keywords : carbon nanostructures * microwave plasma * PECVD * surfatron
Subject RIV: BL - Plasma and Gas Discharge Physics
Various carbon nanostructures were deposited by surface wave discharge from an Ar/CH4/CO2 gas mixture. The type and the form of the carbon nanostructure were controlled by the gas mixture and the gas inlet. The nanostructures that formed were investigated by scanning electron microscopy and by Raman measurements. The influence of the geometrical combination of the gas inlets (via surfatrons or via the gas shower system) into the chamber is found to be a crucial deposition parameter for the controllable growth of desired carbon nanostructures.
Permanent Link: http://hdl.handle.net/11104/0243197
Number of the records: 1