Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam

0437838 - ÚPT 2015 RIV CZ eng C - Conference Paper (international conference)
Horáček, Miroslav - Krátký, Stanislav - Urbánek, Michal - Kolařík, Vladimír - Meluzín, Petr - Matějka, Milan - Chlumská, Jana
Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam.
NANOCON 2014. 6th International conference proceedings. Ostrava: TANGER, 2014. ISBN 978-80-87294-55-0.
[NANOCON 2014. International Conference /6./. Brno (CZ), 05.11.2014-07.11.2014]
R&D Projects: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01; GA TA ČR TE01020118
Institutional support: RVO:68081731
Keywords : e-beam writer * Gaussian beam * variable shaped beam
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering

One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase exposures throughput.
Permanent Link: http://hdl.handle.net/11104/0241322