0436667 - ÚFP 2015 RIV US eng C - Conference Paper (international conference)
Koláček, Karel - Schmidt, Jiří - Štraus, Jaroslav - Frolov, Oleksandr - Prukner, Václav - Melich, Radek
An extreme ultraviolet interferometer suitable to generate dense interference pattern.
Proceedings of SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V. Bellingham: SPIE, 2014 - (Assoufid, L.; Ohashi, H.; Asundi, A.), 92060D-92060D. SPIE, 9206. ISBN 978-1-62841-233-8. ISSN 0277-786X.
[SPIE Conference on Advances in Metrology for X-Ray and EUV Optics V. San Diego (GB), 19.08.2014-21.08.2014]
R&D Projects: GA MŠMT(CZ) LG13029
Institutional support: RVO:61389021
Keywords : Extreme ultraviolet radiation * XUV interferometer * ablation threshold contour * XUV photodesorption * direct nanopatterningby XUV * application of Ar8+ XUV laser
Subject RIV: BH - Optics, Masers, Lasers
http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1904459

t has been designed a new type of interferometer working in extreme ultraviolet (XUV) region and intended for direct imprinting of densest possible (for given wavelength) interference pattern into a substrate. The interferometer belongs to the wave-front division category: each of its two aspheric mirrors reflects approximately one half of incoming laser beam and focuses it into a point image. Both focused beams have to intersect each other, and in the intersection region an interference pattern is generated. The closer the intersection region is to the above-mentioned point images, the smaller the interference field is, but simultaneously the smaller the fringe-pitch is. This paper describes interferometer design (inclusive fringe-pitch calculation, and inclusive design of multilayer reflection coatings for the wavelength 46.9 nm (Ar8+ laser) -ensuring equal reflectivity at different reflection angles).The interferometer design is supplemented not only by ray-tracing verification
Permanent Link: http://hdl.handle.net/11104/0240344