Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering

0435939 - ÚJF 2015 RIV CZ eng C - Conference Paper (international conference)
Horák, Pavel - Bejšovec, Václav - Lavrentiev, Vasyl - Khun, J. - Vrňata, M.
Characterization of the Nanostructured Nickel Oxide Layers Prepared by Ion Beam Sputtering.
NANOCON 2011, Conference Proceedings, 3 rd International Conference. Brno: TANGER Ltd., Ostrava, 2011, s. 674-677. ISBN 978-80-87294-27-7.
[3rd International Conference on NANOCON. Brno (CZ), 21.09.2011-23.09.2011]
R&D Projects: GA ČR(CZ) GAP108/11/1298
Institutional support: RVO:61389005
Keywords : Nickel oxide * Ion Beam Sputtering * Van der Pauw
Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders
http://www.nanocon.eu/files/proceedings/nanocon_11/lists/papers/1096.pdf

Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hall measurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon: oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 10(21) m(-2) - suggesting prevailing metallic conductivity. Resistivity of the sample is increasing with higher amount of oxygen in gas mixture. The as-deposited layer is almost amorphous with no visible grains on AFM.
Permanent Link: http://hdl.handle.net/11104/0239799