Surface wave plasma – attractive solution for industrial uses

0434339 - FZÚ 2015 RIV SK eng C - Conference Paper (international conference)
Davydova, Marina - Šmíd, Jiří - Hubička, Zdeněk - Rezek, Ondřej - Olejníček, Jiří - Čada, Martin - Kromka, Alexander
Surface wave plasma – attractive solution for industrial uses.
Material analysis in vacuum. Bratislava: Slovenská vákuová spoločnosť, 2014 - (Michalka, M.; Vincze, A.; Veselý, M.), s. 129-133. ISBN 978-80-971179-4-8.
[School of Vacuum Technology /17./. Štrbské Pleso (SK), 02.10.2014-05.10.2014]
R&D Projects: GA TA ČR TA01011740
Institutional support: RVO:68378271
Keywords : surface wave plasma * cold plasma * surface treatment * diamond films
Subject RIV: BM - Solid Matter Physics ; Magnetism

This work presents the low temperature oxygen and hydrogen termination of diamond films by surface wave discharge reactor. The influence of the low temperature plasma treatment and process time on the wettability and/ or surface resistivity of the diamond films have been studied. The results indicate that a temperature as low as 250°C is sufficient to induce hydrogen-terminated conductive surface of the order of 108 Ω. An increase in substrate temperature up to 400°C results in decrease of resistivity up to 5×106 Ω.
Permanent Link: http://hdl.handle.net/11104/0238419