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Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets

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    0427184 - FZÚ 2015 RIV CH eng J - Journal Article
    Kubart, T. - Čada, Martin - Lundin, D. - Hubička, Zdeněk
    Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets.
    Surface and Coatings Technology. Roč. 238, JAN (2014), s. 152-157. ISSN 0257-8972
    R&D Projects: GA MŠMT LD12002; GA ČR GAP108/12/2104; GA MŠMT LH12043
    Grant - others:AV ČR(CZ) M100101215
    Institutional support: RVO:68378271
    Keywords : HiPIMS * reactive sputtering * ionized flux fraction
    Subject RIV: BL - Plasma and Gas Discharge Physics
    Impact factor: 1.998, year: 2014

    Ionized metal flux fractions in high power impulsemagnetron sputtering (HiPIMS) were analyzed by a combination of a retarding field analyzer and a quartz crystal microbalance (QCM). Two target materials, Ni and Ti, were studied in an Ar atmosphere. In the case of Ti, the reactive (Ar + O2) mode was also investigated. Ionized metal flux fractions of up to 50% for Ni were observed at a pulse power density of 1 kW cm−2.
    Permanent Link: http://hdl.handle.net/11104/0232785

     
     
Number of the records: 1  

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