Reactive ion etching of polystyrene microspheres

0425611 - FZÚ 2014 RIV CZ eng K - Conference Paper (Czech conference)
Domonkos, Mária - Ižák, Tibor - Štolcová, L. - Proška, J. - Kromka, Alexander
Reactive ion etching of polystyrene microspheres.
Nanomateriály a nanotechnologie ve stavebnictví 2013. Praha: ČVUT, 2013 - (Nežerka, V.; Rácová, Z.; Ryparová, P.; Tesárek, P.), s. 24-28. ISBN 978-80-01-05334-8.
[Nanomateriály a nanotechnologie ve stavebnictví 2013. Praha (CZ), 12.06.2013-12.06.2013]
R&D Projects: GA ČR(CZ) GBP108/12/G108
Institutional support: RVO:68378271
Keywords : nanosphere lithography * reactive ion etching * polystyrene microspheres * Langmuir-Blodgett monolayers
Subject RIV: BL - Plasma and Gas Discharge Physics

This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
Permanent Link: http://hdl.handle.net/11104/0231433