Linear antenna microwave surface wave plasma characterization by Langmuir probe

0424648 - FZÚ 2014 US eng A - Abstract
Potocký, Štěpán - Čada, Martin - Babchenko, Oleg - Ižák, Tibor - Kromka, Alexander
Linear antenna microwave surface wave plasma characterization by Langmuir probe.
4 IC4N (International conference nanoparticles and nanomaterials to nanodevices and nanosystems /4./) Book of Abstracs. Arlington: University of Texas, 2013 - (Meletis, E.; Kanellopoulos, N.; Politis, C.; Schommers, W.). s. 132-132
[IC4N 2013 International conference from nanoparticles and nanomaterials to nanodevices and nanosystems /4./. 16.06.2013-20.06.2013, Corfu]
R&D Projects: GA TA ČR TA01011740; GA MŠMT(CZ) LM2011026; GA ČR GAP205/12/0908
Institutional support: RVO:68378271
Keywords : Langmuir probe * nanocrystalline diamond * plasma enhanced CVD * Raman spectroscopy * SEM
Subject RIV: BL - Plasma and Gas Discharge Physics

In the presented work we analyze a MW-SW plasma assisted CVD process during growth of different carbon forms. Spatially and time resolved Langmuir probe measurements were done to calculate plasma temperature, density of species, plasma potentials, etc. Due to a pulse modulation of MW generator measurements were done in the middle of the pulse (at 3 µs). At each of four different distances between antenna and substrate process parameters were varied according to diamond film transformation i) from poly- to nano-crystalline character, ii) from solid layer to porous structure, and iii) from lower to higher deposition speed. Significant influence by plasma temperature and density, especially for process pressures lower than 50 Pa was observed. A complex correlation between process parameters, plasma characteristics and the deposit is studied and used for explanation of different growth regimes.
Permanent Link: http://hdl.handle.net/11104/0230696