A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration

0423048 - ÚFP 2014 RIV US eng C - Conference Paper (international conference)
Koláček, Karel - Schmidt, Jiří - Štraus, Jaroslav - Frolov, Oleksandr - Prukner, Václav - Melich, Radek - Choukourov, A.
A new method of determination of ablation threshold contour in the spot of focused XUV laser beam of nanosecond duration.
Proceedings of SPIE 8777. Vol. 8777. Bellingham, Washington: SPIE Press, 2013 - (Juha, L.; Bajt, S.; London, R.; Hudec, R.; Pína, L.), 87770N-87770N. Proceedings of SPIE, 8777. ISBN 978-0-8194-9579-2. ISSN 0277-786X.
[SPIE Optics + Optoelectronics 2013. Prague (CZ), 15.04.2013-18.04.2013]
R&D Projects: GA MŠMT(CZ) LG13029
Institutional support: RVO:61389021
Keywords : Extreme ultraviolet radiation * XUV interferometer, ablation threshold contour * XUV photodesorption * direct nanopatterningby XUV * application of Ar8+ XUV laser
Subject RIV: BL - Plasma and Gas Discharge Physics
http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1685663

For nanosecond laser pulses the material removal efficiency in the desorption zone spans from 0 to ~90% and, hence, it is transition to ~100% characteristic for ablation zone is hardly distinguishable. Therefore, it is suggested to use nanopatterning (appearing only in the desorption zone) for determination the ablation contour: the sample is illuminated through a proximity standing grid and regions, where a diffraction pattern appears belong to the desorption zone (examples are shown). Since the diffraction pattern is engraved in the “windows” of the grid only, a homogeneous nanopatterning with interferometer is proposed. A new type of XUV interferometer is designed and numerically tested.
Permanent Link: http://hdl.handle.net/11104/0229123