Structuring of diamond films by reactive ion plasma etching

0389420 - FZÚ 2013 RIV CZ eng K - Conference Paper (Czech conference)
Domonkos, M. - Ižák, Tibor - Proška, J. - Kromka, Alexander
Structuring of diamond films by reactive ion plasma etching.
Nanomateriály a nanotechnologie ve stavebnictví 2012 (NaNS 2012). Praha: ČVUT, 2012 - (Rácová, Z.; Tesárek, P.; Nežerka, V.; Ryparová, P.), s. 35-40. ISBN 978-80-01-05132-0.
[Nanomateriály a nanotechnologie ve stavebnictví 2012 (NaNS 2012). Praha (CZ), 11.09.2012-11.09.2012]
R&D Projects: GA ČR GAP108/12/0910; GA ČR(CZ) GAP108/11/0794; GA AV ČR(CZ) IAAX00100902
Institutional research plan: CEZ:AV0Z10100521
Keywords : nanostructuring * diamond thin films * reactive ion etching * scanning electron microscopy
Subject RIV: BM - Solid Matter Physics ; Magnetism

In this study, two common strategies of diamond film structuring are described. Main focus is on the comparison of top-down and the bottom-up strategies. The top-down strategy is primary related to dry reactive ion etching through masking materials (or even without mask), while bottom-up strategy is based on selective area deposition of diamond film. Several methods of both strategies are demonstrated in details in the article, regarding to their properties and basic principles.
Permanent Link: http://hdl.handle.net/11104/0218280