Proximity effect simulation for variable shape e-beam writer

0386400 - ÚPT 2013 RIV CZ eng C - Conference Paper (international conference)
Kolařík, Vladimír - Matějka, Milan - Urbánek, Michal - Král, Stanislav - Krátký, Stanislav - Mikšík, P. - Vašina, J.
Proximity effect simulation for variable shape e-beam writer.
Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Brno: Institute of Scientific Instruments AS CR, v.v.i, 2012 - (Mika, F.), s. 75-76. ISBN 978-80-87441-07-7.
[International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /13./. Skalský dvůr (CZ), 25.06.2012-29.06.2012]
R&D Projects: GA MŠMT ED0017/01/01; GA MPO FR-TI1/576
Institutional support: RVO:68081731
Keywords : electron scattering effects * e-beam writer * computer simulation
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering

Electron Beam Writer (EBW) is a lithographic tool allowing generation of patterns in high resolution. The writing is carried out into a layer of a sensitive material (resist), which is deposited on the substrate surface (e.g. silicon). The resolution of the EBW is limited not only by the beam spot size, but also by the electron scattering effects (forward scattering, backscattering). Thus, even if the beam spot size on the resist surface is very small, due to electron scattering effect in the resist, the exposed area is significantly broader than the original beam spot size [1, 2].
Permanent Link: http://hdl.handle.net/11104/0215699