Study of intrinsic stress in CNx films prepared by magnetron sputtering device using electron microscopy

0353108 - ÚPT 2011 CZ eng K - Conference Paper (Czech conference)
Mikmeková, Eliška - Sobota, Jaroslav - Caha, O. - Mikmeková, Šárka
Study of intrinsic stress in CNx films prepared by magnetron sputtering device using electron microscopy.
Mikroskopie 2010. Nové Město na Moravě: Československá mikroskopická společnost, 2010 - (Frank, L.; Hozák, P.), s. 56. ISBN N.
[Mikroskopie 2010. Nové Město na Moravě (CZ), 17.02.2010-18.02.2010]
Institutional research plan: CEZ:AV0Z20650511
Keywords : carbon nitride * thin films * RF magnetron sputtering
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering

Preparation and analysis of amorphous carbon nitride thin films (CNx) deposited by RF magnetron sputtering device on silicon wafers (100) is reported.
Permanent Link: http://hdl.handle.net/11104/0006218