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Examination of Very Thin Free-standing Films with Slow Electrons
- 1.0352509 - ÚPT 2011 RIV JP eng C - Conference Paper (international conference)
Müllerová, Ilona - Hovorka, Miloš - Frank, Luděk
Examination of Very Thin Free-standing Films with Slow Electrons.
Proceedings of 5th Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology. Toyama: University of Toyama, 2010, s. 45-48. ISBN 978-4-9903248-2-7.
[JCNCS2010 /5./ Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology. Toyama (JP), 12.09.2010-15.09.2010]
R&D Projects: GA AV ČR IAA100650902; GA MŠMT ED0017/01/01
Institutional research plan: CEZ:AV0Z20650511
Keywords : very low energy STEM * penetration of very slow electrons * graphene
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Free-standing films of thicknesses in units of nm have been examined using both reflected and transmitted electrons in the scanning low energy electron microscope.
Permanent Link: http://hdl.handle.net/11104/0192001
Number of the records: 1