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Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films
- 1.0346487 - FZÚ 2011 RIV GB eng J - Journal Article
Kment, Štěpán - Klusoň, Petr - Hubička, Zdeněk - Krýsa, J. - Čada, Martin - Gregora, Ivan - Deyneka, Alexander - Remeš, Zdeněk - Žabová, Hana - Jastrabík, Lubomír
Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films.
Electrochimica acta. Roč. 55, č. 5 (2010), s. 1548-1556. ISSN 0013-4686. E-ISSN 1873-3859
R&D Projects: GA AV ČR KAN301370701; GA AV ČR KJB100100805; GA AV ČR KAN400720701; GA ČR GA202/09/0800; GA AV ČR KJB100100703
Institutional research plan: CEZ:AV0Z10100522; CEZ:AV0Z40720504
Keywords : TiO * plasma jets
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 3.642, year: 2010
The low temperature double hollow cathode plasma jet method for producing photoresponding thin transparent layers of TiO2-xNx is reported. The RF power magnitude was identified as the parameter affecting substantially the photoinduced properties of the produced films.
Permanent Link: http://hdl.handle.net/11104/0187508
Number of the records: 1