Phase elements by means of photo-lithographic system employing a spatial light modulator

0304116 - URE-Y 20030005 RIV US eng C - Conference Paper (international conference)
Aubrecht, Ivo - Miler, Miroslav - Pala, Jan
Phase elements by means of photo-lithographic system employing a spatial light modulator.
Bellingham: SPIE The International Society for Optical Engineering, 2003. Proceedings of SPIE., 5036. ISBN 0-8194-4837-0. ISSN 0277-786X. In: Photonics, Devices and Systems II. - (Hrabovský, M.; Senderáková, D.; Tománek, P.), s. 63-66
[Photonics Prague'2002 /4./. Prague (CZ), 26.05.2002-29.05.2002 (K)]
R&D Projects: GA ČR GA202/01/0428
Institutional research plan: CEZ:AV0Z2067918
Keywords : spatial light modulators * photolitography * photoresists
Subject RIV: BH - Optics, Masers, Lasers

The system employs a spatial light modulator (SML), between a pair of crossed polarizers, and an electronic shutter. Transmission of the SLM with the polarizers is controlled by graphic software that defines which pixels are fully transparent and which are fully opaque. While a particular binary graphics is on the SLM the electronic shutter allows light to pass for a certain time. The graphics is imaged, by an objective, onto a photoresist plate. A mercury lamp is used as a light source. The graphics changes after each exposition and the whole sequence of images determines the resultant surface-relief modulation.
Permanent Link: http://hdl.handle.net/11104/0114257