Phase elements by means of lithographic system emploing a spatial light modulator

0304044 - URE-Y 20020127 CZ eng A - Abstract
Aubrecht, Ivo - Miler, Miroslav - Pala, Jan
Phase elements by means of lithographic system emploing a spatial light modulator.
Praha: TECHMARKET, 2002. ISBN 80-86114-46-5. Photonics Prague 2002. Technical Programme & Abstract Booklet. - (Tománek, P.). s. 54
[Photonics Prague'2002 /4./. 26.05.2002-29.05.2002, Prague]
R&D Projects: GA ČR GA202/01/0428
Institutional research plan: CEZ:AV0Z2067918
Keywords : spatial light modulators * photolitography * photoresists
Subject RIV: BH - Optics, Masers, Lasers

The system employs a spatial light modulator (SML), between a pair of crossed polarizers, and an electronic shutter. Transmission of the SLM with the polarizers is controlled by graphic software that defines which pixels are fully transparent and which are fully opaque. While a particular binary graphics is on the SLM the electronic shutter allows light to pass for a certain time. The graphics is imaged, by an objective, onto a photoresist plate. A mercury lamp is used as a light source. The graphics changes after each exposition and the whole sequence of images determines the resultant surface-relief modulation.
Permanent Link: http://hdl.handle.net/11104/0114188