Application of AFM in microscopy and fabrication of micro/nanostructures

0205548 - UPT-D 20020098 RIV GB eng J - Journal Article
Lopour, F. - Kalousek, R. - Škoda, D. - Spousta, J. - Matějka, František - Šikola, T.
Application of AFM in microscopy and fabrication of micro/nanostructures.
Surface and Interface Analysis. Roč. 34, č. 1 (2002), s. 352 - 355. ISSN 0142-2421. E-ISSN 1096-9918
R&D Projects: GA MŠMT ME 334; GA MŠMT ME 480
Institutional research plan: CEZ:AV0Z2065902
Keywords : AFM fabrication * local anodic oxidation * oxide nanostructures
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.071, year: 2002

Atomic force microscopy (AFM) studies of microstructures made by ion beams on Si and Au surfaces and by AFM local anodic oxidation on Ti thin filmsis presented in the paper. By using the AFM technique, etching limits of inert atoms in the production of silicon and silver grids were found. It was proved thet the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, thehalf-width of the lines did not depend linearly on this voltage. The results are useful for experiments in the fabrication of nanoelectronic devices (e.g. single-electron transistors).
Permanent Link: http://hdl.handle.net/11104/0101161