0185548 - UJF-V 20020053 RIV NL eng J - Journal Article
Wágner, T. - Macková, Anna - Peřina, Vratislav - Rauhala, E. - Seppälä, A. - Kasap, S. O. - Frumar, M. - Vlček, M.
The study of photo-and thermally-induced diffusion and dissolution of Af in As30S70 amorphous films and its reastion products.
Journal of Non-Crystalline Solids. Roč. 299, č. 1 (2002), s. 1028-1032. ISSN 0022-3093. E-ISSN 1873-4812
R&D Projects: GA ČR GP102/01/D069
Keywords : state chemical-reaction * photoenhanced dissolution * kinetics * backscattering * layers * glass
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.435, year: 2002

Kinetics of photo- and thermally-induced diffusion and dissolution (PIDD and TIDD) of silver in a-As30S70 films were measured by monitoring the change in thickness of the undoped chalcogenide using a modified computer-controlled reflectivity technique. Silver-concentration profiles during photo- and thermally-induced solid-state reactions were traced by means of Rutherford backscattering spectroscopy (RBS). The enthalpy of photo- and thermally-induced reactions was measured by means of differential photocalorimetry and quasi-isothermal temperature-modulated differential scanning calorimetry (DSC) which are shown to be connected with the chemical reaction: Ag + As3S7 = AgAsS2 + As2S5.
Permanent Link: http://hdl.handle.net/11104/0081941