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IR Laser Induced Decomposition of 2-chloroethenylsilane for Chemical Vapour Deposition of Si/C Phases

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    0179962 - UFCH-W 960078 RIV GB eng J - Journal Article
    Santos, M. - Diaz, L. - Bastl, Zdeněk - Hulínský, V. - Urbanová, Markéta - Vítek, Josef - Pola, Josef
    IR Laser Induced Decomposition of 2-chloroethenylsilane for Chemical Vapour Deposition of Si/C Phases.
    Journal of Materials Chemistry. Roč. 6, č. 6 (1996), s. 975-981. ISSN 0959-9428
    R&D Projects: GA AV ČR IAA4072509
    Impact factor: 1.660, year: 1996
    Permanent Link: http://hdl.handle.net/11104/0001736

     
     

Number of the records: 1  

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