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Modeling of diffusion barrier in nanocrystalline growth
- 1.0178145 - UFM-A 20033166 RIV SIGLE CZ eng C - Conference Paper (international conference)
Čermák, Jiří - Rothová, Věra
Modeling of diffusion barrier in nanocrystalline growth.
NANO 03. Brno: VUT Brno, fakulta strojního inženýrství, 2003 - (Šandera, P.), s. 232-235. ISBN 80-214-2527-X.
[International Conference NANO /03./. Brno (CZ), 21.10.2003-23.10.2003]
R&D Projects: GA ČR GA106/01/0384; GA AV ČR IBS2041105; GA AV ČR Z20419004-I004
Institutional research plan: CEZ:AV0Z2041904
Keywords : FINEMET * Ge diffusion * nanocrystalline growth
Subject RIV: BM - Solid Matter Physics ; Magnetism
The diffusion of Ge, simulationg the diffusion of Si was studied in eutectic Fe-Nb, in iron and in the Fe2Nb compound, which models the Nb-rich envelope of growing FexSi crystallites in FINEMETs.
Permanent Link: http://hdl.handle.net/11104/0075035
Number of the records: 1