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Raman bands in microwave plasma assisted chemical vapour deposited films
- 1.0178058 - UFM-A 20033076 RIV NL eng J - Journal Article
Kadlečíková, M. - Breza, J. - Veselý, M. - Frgala, Z. - Kudrle, V. - Janča, J. - Janík, J. - Buršík, Jiří
Raman bands in microwave plasma assisted chemical vapour deposited films.
Microelectronics Journal. Roč. 34, č. 11 (2003), s. 1075-1077. ISSN 0026-2692. E-ISSN 1879-2391
R&D Projects: GA AV ČR IBS2041105; GA MŠMT OC 527.20
Institutional research plan: CEZ:AV0Z2041904
Keywords : chemical vapour deposition * diamond * Raman spectroscopy
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 0.565, year: 2003
Raman spectroscopy is employed to characterize thin diamond films deposited by microwave plasma assisted chemical vapour deposition technique using a gas mixture of methane and hydrogen. The surface morphology was analyzed by scanning electron microscopy.The submicron crystals on (100) facets of diamond crystals gave rise to bands in the Raman spectrum.
Permanent Link: http://hdl.handle.net/11104/0074952
Number of the records: 1