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Influence of nitrogen-argon gas mixtures on reactive magnetron sputtering of hard Si-C-N films
- 1.0134653 - FZU-D 20030553 RIV NL eng J - Journal Article
Vlček, J. - Kormunda, M. - Čízek, J. - Peřina, Vratislav - Zemek, Josef
Influence of nitrogen-argon gas mixtures on reactive magnetron sputtering of hard Si-C-N films.
Surface and Coatings Technology. Roč. 160, - (2002), s. 74-81. ISSN 0257-8972
R&D Projects: GA MŠMT ME 203
Institutional research plan: CEZ:AV0Z1010914; CEZ:MSM 235200002; CEZ:AV0Z1048901
Keywords : silicon-carbon-nitride films * magnetron co-sputtering * mass spectroscopy * elemental composition * surface bonding structure * hardness
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.267, year: 2002
It was shown that the nitrogen-argon gas mixture composition is an important process parameter in a reproducible production of Si-C-N compounds with controlled properties by dc magnetron co-sputtering using a composed C-Si target with variable Si/C area ratios.
Permanent Link: http://hdl.handle.net/11104/0032547
Number of the records: 1