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Vapor pressure of metal organic precursors

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    0134203 - FZU-D 20030096 RIV NL eng J - Journal Article
    Fulem, M. - Růžička, K. - Růžička, V. - Hulicius, Eduard - Šimeček, Tomislav - Melichar, Karel - Pangrác, Jiří - Rushworth, S. A. - Smith, L. M.
    Vapor pressure of metal organic precursors.
    Journal of Crystal Growth. Roč. 248, - (2003), s. 99-107. ISSN 0022-0248. E-ISSN 1873-5002
    R&D Projects: GA ČR GA102/99/0414
    Institutional research plan: CEZ:AV0Z1010914
    Keywords : organometallic precursors * static method * vapor pressure
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 1.414, year: 2003

    The vapour pressure of four metal organic precursors, diethylzinc, triethylantimony, trimethygallium and trimethylaluminium used in the metal organic vapor phase processes was measured by a state method in the technologically important temperature range. The experimental data were fitted by the Antoine equation.
    Permanent Link: http://hdl.handle.net/11104/0032119

     
     

Number of the records: 1  

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