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Influence of the additional RF discharge on the properties of carbon nitride thin films deposited by PLD
- 1.0134067 - FZU-D 20020356 RIV US eng C - Conference Paper (international conference)
Lančok, Ján - Novotný, Michal - Bulíř, Jiří - Jelínek, Miroslav - Zelinger, Zdeněk
Influence of the additional RF discharge on the properties of carbon nitride thin films deposited by PLD.
0-8194-4528-2. In: Advanced Laser Technologies. Bellingham: SPIE International Society for Optical Engineering, 2002 - (Dimitras, D.; Dinescu, M.; Konov, V.), s. 118-124. Proceedings of SPIE., 4762. ISSN 0277-786X.
[ALT'01 International Conference on Advanced Laser Technologies. Constanta (RO), 11.09.2001-14.09.2001]
Institutional research plan: CEZ:AV0Z1010914
Keywords : carbon nitride thin films * PLD * RF discharge
Subject RIV: BM - Solid Matter Physics ; Magnetism
Nitrogen-rich carbon nitride films were prepared by pulsed laser deposition combined with additional r.f. and hollow cathode discharge on fused silica, stainless steel and silicon substrates.
Permanent Link: http://hdl.handle.net/11104/0032004
Number of the records: 1