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Tantalum ions produced by 1064 nm pulsed laser irradiation
- 1.0133983 - FZU-D 20020271 RIV US eng J - Journal Article
Torrisi, L. - Gammino, S. - Andó, L. - Láska, Leoš
Tantalum ions produced by 1064 nm pulsed laser irradiation.
Journal of Applied Physics. Roč. 91, - (2002), s. 4685-4692. ISSN 0021-8979. E-ISSN 1089-7550
Institutional research plan: CEZ:AV0Z1010921
Keywords : pulsed laser irradiation * high-temperature plasma production * Nd:YAG laser
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 2.281, year: 2002
A Q-switched Nd:YAG laser (1064 nm wavelength) with a 9 ns pulse width 1-900 mJ pulse energy, and 0.5 mm2 target spot, is employed to irradiate tantalum targets in vacuum.The irradiation produces a strong etching of the metal and forms a plasma in front of the target.The plasma contains neutrals and ions with a high charge state and wide energy distribution.
Permanent Link: http://hdl.handle.net/11104/0031930
Number of the records: 1