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Effect of reactive gas pressure on the plasma parameters during triode ion plating of Cr-C films
- 1.0133319 - FZU-D 20010114 RIV CZ eng J - Journal Article
Maček, M. - Čekada, M. - Panjan, P. - Mišina, Martin
Effect of reactive gas pressure on the plasma parameters during triode ion plating of Cr-C films.
Czechoslovak Journal of Physics. Roč. 50, Suppl. S3 (2000), s. 403-408. ISSN 0011-4626.
[Symposium on Plasma Physics and Technology /19./. Praha, 06.06.2000-09.06.2000]
Institutional research plan: CEZ:AV0Z1010914
Keywords : Cr-C films * partial presser of the reactive gas * triode ion plating
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 0.298, year: 2000
Mechanical properties and the average chemical composition of Cr-C hard coatings deposited by means of triode ion plating strongly depends on the partial pressure of the reactive gas (C2H2) during the deposition.
Permanent Link: http://hdl.handle.net/11104/0000612
Number of the records: 1