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Plasma nitriding combined with a hollow cathode discharge sputtering at high pressure
- 1.0132086 - FZU-D 980340 RIV US eng J - Journal Article
Benda, M. - Vlček, J. - Cibulka, V. - Musil, Jindřich
Plasma nitriding combined with a hollow cathode discharge sputtering at high pressure.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 15, č. 5 (1997), s. 2636-2643. ISSN 0734-2101. E-ISSN 1520-8559
R&D Projects: GA ČR GV106/96/K245
Impact factor: 1.576, year: 1997
Permanent Link: http://hdl.handle.net/11104/0030124
Number of the records: 1