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Fabrication of highly stable and low defect density amorphous silicon films at low substrate temperature by plasma chemical vapor deposition assisted with piezoelectric vibration
- 1.0130577 - FZU-D 950162 RIV JP eng J - Journal Article
Sumiya, M. - Kawasaki, M. - Kočka, Jan - Koinuma, H.
Fabrication of highly stable and low defect density amorphous silicon films at low substrate temperature by plasma chemical vapor deposition assisted with piezoelectric vibration.
Japanese Journal of Applied Physics. Roč. 34, - (1995), s. L97-L100. ISSN 0021-4922. E-ISSN 1347-4065
R&D Projects: GA ČR GA202/95/1445
Impact factor: 1.100, year: 1995
Permanent Link: http://hdl.handle.net/11104/0028695
Number of the records: 1