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Detection of residual molybdenum impurity in CVD diamond

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    0101832 - UJF-V 20048249 RIV DE eng J - Journal Article
    Kromka, A. - Kravetz, R. - Poruba, A. - Zemek, J. - Peřina, Vratislav - Rosa, J. - Vaněček, M.
    Detection of residual molybdenum impurity in CVD diamond.
    [Detekce zbytkové molybdenové nečistoty v CVD diamantu.]
    Physica Status Solidi A. Roč. 199, č. 1 (2003), s. 108-112. ISSN 0031-8965
    R&D Projects: GA AV ČR KSK1010104
    Institutional research plan: CEZ:AV0Z1048901
    Keywords : transform photocurrent spectroscopy * electron-paramagnetic-resonance
    Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders
    Impact factor: 0.950, year: 2003

    Raman scattering, X-ray photoemission spectroscopy (XPS), Fourier transform photocurrent spectroscopy (FTPS), Rutherford backscattering (RBS) and electron paramagnetic resonance (EPR) method have been used for characterization of diamond layers deposited by microwave plasma enhanced chemical vapor deposition (MWPECVD). As substrates, thick silicon wafers pretreated by the mechanical seeding have been used, surrounded by the molybdenum ring. Here we report how this configuration can lead to the Mo contamination of diamond layers (similar effect to the well known contamination of diamond by Si) and we study the optical spectra related to the presence of molybdenum and other impurities over the bulk of deposited layers. Mo contamination was confirmed by XPS measurements, but we were not able to detect it by RBS and EPR

    Ramanův rozptyl, spektroskopie fotoemise X-paprsků(XPS), Fourierova transformace ve spektroskopii fotoproudů (FTPS), Rutherfordův zpětný rozptyl (RBS) a elektronová paramagnetická rezonance (EPR) jsou užity pro charakterizování diamantových vrstech, deponovaných mikrovlným plasmatem z chemických par (MVPECVD)
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