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Escape probability of photoelectrons from silver sulphide
- 1.0100131 - FZU-D 20040111 RIV NL eng J - Journal Article
Zemek, Josef - Jiříček, Petr - Hucek, Stanislav - Jablonski, A. - Lesiak, B.
Escape probability of photoelectrons from silver sulphide.
[Úniková pravděpodobnost fotoelektronů z AgS.]
Surface Science. Roč. 473, - (2001), s. 8-16. ISSN 0039-6028. E-ISSN 1879-2758
Institutional research plan: CEZ:AV0Z1010914
Keywords : computer simulations * electron-solid scattering and transmission-elastic * electron-solid scattering-inelastic * X-ray photoelectron spectroscopy * silver * polycrystalli ne surfaces
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 2.189, year: 2001
The escape probability as a function of depth of origine for the S 2s photoelectrons at .alpha.=0o exhibited a non-monotonic behaviour with a maximum beneath the surface at a depth of 0.6-0.8 nm
Hloubková závislost únikové pravděpodobnosti S 2s fotoelektronů není monotonní funkcí hloubky původu fotoelektronů. Vytváří maximum pod povrchem v hloubce 0.6-0.8 nm
Permanent Link: http://hdl.handle.net/11104/0007637
Number of the records: 1