0026802 - ÚMCH 2006 RIV NL eng J - Journal Article
Meszároš, Oto - Schmidt, Pavel - Pospíšil, Jan - Nešpůrek, Stanislav
Photooxidation of poly[methyl(phenyl)silylene] and effect of photostabilizers.
[Fotooxidace polymethysilylenu a působení fotostabilizátoru.]
Polymer Degradation and Stability. Roč. 91, č. 3 (2006), s. 573-578. ISSN 0141-3910. E-ISSN 1873-2321.
[International Conference on Modification, Degradation, Stabilization Conference /3./. Lyon, 29.08.2004-02.09.2004]
R&D Projects: GA MŠMT ME 700; GA MŠMT OC D14.30
Institutional research plan: CEZ:AV0Z40500505
Keywords : polysilane degradation * poly[methyl(phenyl)silylene] * photooxidation
Subject RIV: CD - Macromolecular Chemistry
Impact factor: 2.174, year: 2006

Poly[methyl(phenyl)silylene] was photooxidized in weatherometer ATLAS Ci 3000+. The kinetics of photodegradation changes was determined by FTIR and UV spectroscopies. The photodegradation was slowed down using UV absorbers and their c ombination with hindered amine stabilizers.

Poly[methyl(fenyl)silylen] byl fotooxidován v aparatuře ATLAS Ci 3000+. Průběh fotodegradace byl sledován pomocí FTIR and UV spektroskopie. Tyto změny byly podstatně zpomaleny stabilizací pomocí UV absorbérů a jejich směsí se stíněnými aminy.
Permanent Link: http://hdl.handle.net/11104/0116981