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Review/Citation:  CHEN, S.-H., ŽIVNÝ, Oldřich, MAŠLÁNI, Alan, CHAU, S.-W. Abatement of fluorinated compounds in thermal plasma flow. Journal of Fluorine Chemistry. 2019, 217(1), 41-49. ISSN 0022-1139. E-ISSN 1873-3328
Requested document:  Abatement of fluorinated compounds in thermal plasma flow.pdf - Publisher’s postprint
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