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Review/Citation:  VASIN, Andrii, SLOBODIAN, O., RUSAVSKY, A., GUDYMENKO, O., LYTVYN, P., TIAGULSKYI, Stanislav, YATSKIV, Roman, GRYM, Jan, BORTCHAGOVSKY, E.B., DZHAGAN, V., ZAHN, D., NAZAROV, A. Nanoscale morphology tailoring in plasma deposited CN (x) layers. Journal of Physics D-Applied Physics. 2023, 56(27), 275302. ISSN 0022-3727. E-ISSN 1361-6463
Requested document:  UFE 0571728.pdf - Other
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