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Review/Citation:  VASIN, A.V., RUSAYSKY, A. V., BORTCHAGOVSKY, E. G., GOMENIUK, Y.V., NIKOLENKO, A.S., STRELCHUK, V.V., YATSKIV, Roman, TIAGULSKYI, Stanislav, PRUCNAL, S., SKORUPA, W., NAZAROV, A.N. Methane as a novel doping precursor for deposition of highly conductive ZnO thin films by magnetron sputtering. Vacuum. 2020, 174(April), 109199. ISSN 0042-207X. E-ISSN 1879-2715
Requested document:  UFE 0538153.pdf - Other
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