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0573847 - FZÚ 2024 RIV GB eng J - Journal Article
Kapran, Anna - Hippler, Rainer - Wulff, H. - Olejníček, Jiří - Písaříková, Aneta - Čada, Martin - Hubička, Zdeněk
Characteristics of a pulsed hollow cathode discharge operated in an Ar+O₂ gas mixture and deposition of copper nickel oxide thin films.
Vacuum. Roč. 215, Sept. (2023), č. článku 112272. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institutional support: RVO:68378271
Keywords : hollow cathode discharg * plasma diagnostics * mixed CuNiO thin film * film diagnostics * photoelectrochemical activity
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 4, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2023.112272
Permanent Link: https://hdl.handle.net/11104/0344198