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0571728 - ÚFE 2024 RIV US eng J - Journal Article
Vasin, Andrii - Slobodian, O. - Rusavsky, A. - Gudymenko, O. - Lytvyn, P. - Tiagulskyi, Stanislav - Yatskiv, Roman - Grym, Jan - Bortchagovsky, E.B. - Dzhagan, V. - Zahn, D. - Nazarov, A.
Nanoscale morphology tailoring in plasma deposited CN (x) layers.
Journal of Physics D-Applied Physics. Roč. 56, č. 27 (2023), č. článku 275302. ISSN 0022-3727. E-ISSN 1361-6463
Institutional support: RVO:67985882
Keywords : CN (x) thin layers * nanoscale morphological shaping * plasma deposition
OECD category: Materials engineering
Impact factor: 3.4, year: 2022
Method of publishing: Open access
Permanent Link: https://hdl.handle.net/11104/0345173