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0569330 - FZÚ 2024 RIV NL eng J - Journal Article
Hospodková, Alice - Hájek, František - Hubáček, Tomáš - Gedeonová, Zuzana - Hubík, Pavel - Mareš, Jiří J. - Pangrác, Jiří - Dominec, Filip - Kuldová, Karla - Hulicius, Eduard
Electron mobility in GaN layers and HEMT structure optimized by MOVPE technological parameters.
Journal of Crystal Growth. Roč. 605, March (2023), č. článku 127061. ISSN 0022-0248. E-ISSN 1873-5002
R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) LTAIN19163; GA ČR(CZ) GF22-28001K
Institutional support: RVO:68378271
Keywords : HEMT * GAN * metalorganic vapor phase epitaxy
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)
Impact factor: 1.8, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.jcrysgro.2022.127061
Permanent Link: https://hdl.handle.net/11104/0342034