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0567523 - FZÚ 2023 RIV GB eng J - Journal Article
Mareš, P. - Dubau, M. - Polášek, J. - Mates, Tomáš - Kozák, T. - Vyskočil, J.
High deposition rate films prepared by reactive HiPIMS.
Vacuum. Roč. 191, Sep (2021), č. článku 110329. ISSN 0042-207X. E-ISSN 1879-2715
R&D Projects: GA MŠMT LM2018110; GA MŠMT(CZ) EF16_019/0000760; GA MPO FV30177
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760; AV ČR(CZ) StrategieAV21/6
Program: StrategieAV
Institutional support: RVO:68378271
Keywords : reactive magnetron sputtering * HiPIMS * Monte-carlo simulations * deposition rate * sputtering yield
OECD category: Coating and films
Impact factor: 4.110, year: 2021
Method of publishing: Limited access
https://doi.org/10.1016/j.vacuum.2021.110329
Permanent Link: https://hdl.handle.net/11104/0338777