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0566773 - FZÚ 2023 RIV US eng J - Journal Article
Hrubantová, Aneta - Hippler, Rainer - Wulff, H. - Čada, Martin - Gedeon, O. - Jiříček, Petr - Houdková, Jana - Olejníček, Jiří - Nepomniashchaia, Natalia - Helm, C.A. - Hubička, Zdeněk
Copper tungsten oxide (Cu_xWO_y) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering.
Journal of Applied Physics. Roč. 132, č. 21 (2022), č. článku 215301. ISSN 0021-8979. E-ISSN 1089-7550
R&D Projects: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA21-04477S
Grant - others:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Research Infrastructure: CzechNanoLab - 90110
Institutional support: RVO:68378271
Keywords : HiPIMS * sputtering * photoelectrochemical activity * FTO glass * film properties
OECD category: Coating and films
Impact factor: 3.2, year: 2022
Method of publishing: Open access
Permanent Link: https://hdl.handle.net/11104/0338068