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0552187 - FZÚ 2022 RIV CH eng J - Journal Article
Mukhopadhyay, A.K. - Roy, A. - Bhattacharjee, G. - Das, S.C. - Majumdar, A. - Wulff, H. - Hippler, Rainer
Surface stoichiometry and depth profile of Ti_x-Cu_yN_z thin films deposited by magnetron sputtering.
Materials. Roč. 14, č. 12 (2021), č. článku 3191. E-ISSN 1996-1944
Institutional support: RVO:68378271
Keywords : magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.748, year: 2021
Method of publishing: Open access
Permanent Link: http://hdl.handle.net/11104/0327392