Basket

  1. 1.
    0552187 - FZÚ 2022 RIV CH eng J - Journal Article
    Mukhopadhyay, A.K. - Roy, A. - Bhattacharjee, G. - Das, S.C. - Majumdar, A. - Wulff, H. - Hippler, Rainer
    Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering.
    Materials. Roč. 14, č. 12 (2021), č. článku 3191. E-ISSN 1996-1944
    Institutional support: RVO:68378271
    Keywords : magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy
    OECD category: Fluids and plasma physics (including surface physics)
    Impact factor: 3.748, year: 2021
    Method of publishing: Open access
    Permanent Link: http://hdl.handle.net/11104/0327392
    FileDownloadSizeCommentaryVersionAccess
    0552187.pdf25.6 MBCC LicencePublisher’s postprintopen-access