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0545141 - ÚPT 2022 RIV CZ cze V - Research Report
Meluzín, Petr - Chlumská, Jana - Kolařík, Vladimír - Kopal, Jaroslav
SMV-2021-02: Vývoj a realizace amplitudové masky pro justáž optomechanických soustav.
[SMV-2021-02: Development and implementation of amplitude masks for adjustment of optomechanical systems.]
Brno: Meopta - optika, s.r.o., 2021. 6 s.
Source of funding: N - Non-public resources
Keywords : e-beam lithography * lithography mask
OECD category: Optics (including laser optics and quantum optics)
Permanent Link: http://hdl.handle.net/11104/0321889